Products

SiO2 Sacrificial Layer Etching System Vetelgeuse

Sacrificial Layer Etching

Si02 Sacrificial Layer Etching System Fluoride (HF) for MEMS industry use.

SiO2 Sacrificial Layer Etching System
Infrared Bolometer structure
Infrared Bolometer structure
Cantilever structure
Cantilever structure
SOI Wafer BOX Layer release
SOI Wafer BOX Layer release
Silicon oscillator structure
Silicon oscillator structure（Source：SiTime）

Feature

Capable of etching structures containing aluminum electrodes without corroding the aluminum
Capable of microfabrication and long undercut in millimeter
Capable of no waste liquid treatment, low frequency maintenance and high stability by Dry process
Capable of R&D use and Mass Production use by wide Plat Form line up from simple manual type to cluster type

Application

MEMS Device *

＊MEMS Device : Accelerometer, Gyro sensor,　Pressure sensor, Silicon microphone, Silicon resonator, Optical switch

Products Category

Contact About Equipment

+81 6-6489-5997

Get Product Support

+81 6-6489-5848

Contact About Equipment

+81664895997

Get Product Support

+81664895848

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